ECE 293: MEMS, MOEMS and Optoelectronic Devices, Systems and Applications

Prof. Gregory Tangonan and Dr. Nathaniel Libatique

This is a graduate level course that discusses the physics of information technology in the context of the fundamental limits of a number of devices, from optical detectors and lasers, through microsystems and nanoscale devices. Questions of interest include what is the origin of the bandgap, what is shot noise limited detection, what are the fabrication limits of data storage technologies, what forces dominate the design of micro and nano-scale actuators? The students participate in the class through presentations of solved problems using simulation and computational tools such as Scilab and Mathematica and discuss in a series of presentations a chosen device technology, its key operating principle and use, commercial trends and future novel applications.

• Classes will resume January 6, 2008. Please be ready to present and discuss in class solutions to homework problems and/or start series of presentations on your selected device platforms.

• Homework problems include multiple reflection calculation, Poisson distribution calculations, circuit/system design for detection at noise limits, and series of presentations on a chosen technology.

• Noise_and_Detection.ppt: Noise_and_Detection.ppt

• Compressed_MEMS_and_Optoelectronic_Devices.ppt: MEMS. MOEMS, and Other Devices

• Fabrication.ppt: Lecture on microelectronics fabrication processes

• film_deposition.ppt: etching and deposition of thin films

• A15-Wet-etching-rates.pdf: determination of etch rates

• A18-Colors-for-SiO2-films-on-Si.pdf: color of SiO2? oxide films

• A26-Wet-chemical-etching-of-SiO2-with-BOE.pdf: Wet etch with buffered oxide etch solutions